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Date: 2011
Language: eng
Resource Type: journal article
Identifier: http://hdl.handle.net/1959.14/112640
Description: A remote plasma chemical vapour deposition (RPCVD) system for the growth of gallium nitride (GaN) thin films is investigated using optical emission spectroscopy (OES). The intensities of the various e ... More
Reviewed: Reviewed
Date: 2010
Subject Keyword: 020500 Optical Physics | plasma | VUV | excimer
Language: eng
Resource Type: conference paper
Identifier: http://hdl.handle.net/1959.14/1142599
Description: 2 page(s)
Reviewed: Reviewed
Date: 2009
Subject Keyword: plasma | light source | vuv
Language: eng
Resource Type: conference paper abstract
Identifier: http://hdl.handle.net/1959.14/1208583
Description: 1 page(s)
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