High energy laser pulse irradiation of a silica microsphere on a glass surface for sub-micron patterning | Macquarie University ResearchOnline

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Title: High energy laser pulse irradiation of a silica microsphere on a glass surface for sub-micron patterning
Related: International Conference on Nanoscience and Nanotechnology (2006) (3 - 7 July 2006 : Brisbane)
Related: 2006 International conference on nanoscience and nanotechnology : proceedings, p.27-30
DOI: 10.1109/ICONN.2006.340541
Publisher: Piscataway, NJ : IEEE
Date: 2006
Author/Creator: Kane, D. M
Author/Creator: Joyce, A. M
Description: Irradiating silica microspheres, on a silica or glass surface, with single, high-energy, laser pulses from a KrF excimer laser, has generated a wealth of different micron and sub-micron, topological patterns in the substrate. Optical surface profilometry has been used as the experimental technique to study the patterns formed. Comparison of the experimental results with theoretical results from sophisticated models developed by Lukyanchuk and co-workers, and Arnold and co-workers is presented.
Description: 4 page(s)
Subject Keyword: krypton compounds
Subject Keyword: laser materials processing
Subject Keyword: nanopatterning
Subject Keyword: silicon compounds
Resource Type: conference paper
Organisation: Macquarie University. Dept. of Physics

Identifier: http://hdl.handle.net/1959.14/26813
Identifier: ISBN:1424404533
Identifier: mq-rm-2006005777
Language: eng
Rights: Copyright 2006 IEEE. Reprinted from 2006 International conference on nanoscience and nanotechnology : proceedings. This material is posted here with permission of the IEEE. Such permission of the IEEE does not in any way imply IEEE endorsement of any of Macquarie University’s products or services. Internal or personal use of this material is permitted. However, permission to reprint/republish this material for advertising or promotional purposes or for creating new collective works for resale or redistribution must be obtained from the IEEE by writing to pubs-permissions@ieee.org. By choosing to view this document, you agree to all provisions of the copyright laws protecting it.
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